Available Technology
Novel apparatus turns liquids into vapors for use in chemical vapor deposition
Technology:
Vaporization apparatus
Markets Addressed
The device can vaporize liquids with high efficiency even if they have low vapor pressures and limited thermal stability. Potential application includes use in semiconductor manufacturing.
Innovations and Advantages
The technology employs a high-frequency ultrasonic plate to break the liquid into tiny droplets and a gas-dynamic sorting tower to reprocess larger droplets into smaller ones before quickly vaporizing them. The vapor concentration can be set to a known and reproducible value by setting the pumping rate. The apparatus can rapidly start and stop the vapor flow. The pressure drop in the carrier gas is very small. Only a very small dead volume of liquid is contained in the apparatus at any given time, so little is wasted when the system is cleaned.
Additional Information
Intellectual Property Status: Issued U.S. patent nos.: 6,180,190
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Inventor(s):
Gordon, Roy G.
Categories:
For further information, please contact:
Mick Sawka, Director of Business Development
(617) 496-3830
Reference Harvard Case #1458